Main Composition
Composition |
Contents |
CAS No. | EC No. |
Pure water |
90-92% |
7732-18-5 |
231-791-2 |
Sodium carbonate |
1.0-3.0% |
5968-11-6 |
207-838-8 |
Acrylic block branched compound |
1.0-2.0% |
/ |
/ |
Surfactant |
1.0-1.5% |
25155-30-0 |
246-680-4 |
Preservative acid |
0.1%-1.5% |
137-40-6 |
205-290-4 |
Features
1. High environmental protection level: selective etching can be achieved without the use of organic bases such as TMAH;
2. Low production cost: Compared with the common pretreatment using hydrofluoric acid/nitric acid on the market, the production cost is greatly reduced;
3. High etching efficiency: Compared with the Perc battery process, the conversion efficiency is increased by more than 1.2%;
Wafer size |
Appearance |
Photoelectric conversion |
Life |
210 |
The etching surface is normal and the positive film has no corrosion. |
24.4%~24.6% |
240+ |
Technical Parameters
/L First liquid dispensing
|
/L Liquid infusion |
/L Intermission-draining |
Temperature/degree |
Reaction time/second |
|
48%KOH |
8~10 |
0.3~0.45 |
5~7 |
63~64 |
100~200 |
Additive JH2570 |
2.0~4.0 |
0.18~0.21 |
|||
Pure water |
440.0 |
/ |
These properties may vary depending on the single crystal wafer, process, batch, and size.
Applications
1、This product is aimed at removing amorphous silicon coating from topcon cells;
2、 Suitable for monocrystalline cells of 210, 186, 166, and 158 specifications.
Product Features
No.
|
Parameter
|
Main parameters and project indicators |
1 |
Color, shape |
Colorless to light yellow transparent liquid |
2 |
PH value |
7.0-10.0 |
3 |
density |
1.05-1.5g/ml |
4 |
Storage conditions |
Store at room temperature away from light |